Isotope effect of ion sputtering

GUO Wenlu ZHANG Xiurong

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Isotope effect of ion sputtering

更新时间：2021-03-12

- Isotope effect of ion sputtering
- NUCLEAR TECHNIQUES Issue 9, (2004)
- 作者机构：
  
  1. 江苏科技大学
  2. 江苏科技大学,镇江,212003
- 作者简介：
- 基金信息：
- DOI：
  CLC： TG174.44
- Published：01 September 2004
- 稿件说明：
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[1]郭文录,张秀荣.离子溅射的同位素效应[J].核技术,2004(09):666-670.

GUO Wenlu ZHANG Xiurong. Isotope effect of ion sputtering[J]. Nuclear techniques, 2004, (9): 666-670.
[1]郭文录,张秀荣.离子溅射的同位素效应[J].核技术,2004(09):666-670. DOI：

GUO Wenlu ZHANG Xiurong. Isotope effect of ion sputtering[J]. Nuclear techniques, 2004, (9): 666-670. DOI：

摘要

以低能零剂量Cu-65Cu和Mo-100Mo溅射为例

用MonteCarlo（MC）模拟研究了零剂量同位素富集6392度是否与出射角有关;是PKA（Primaryknock-onatoms）的贡献还是SKA（Secondaryknock-onatoms）的贡献。文中综述了各种争论

并阐明了作者的观点。

Abstract

As a calculating instance of low-energy and zero-fluence isotope ( 63Cu-65Cu and92 Mo-100Mo) sputtering

the Monte Carlo (MC) simulation has been used to study whether the isotope enrichment is ejection-angle-dependent or not

and also to study which contribution

from the primary knock-on atoms or from the secondary ones

is essential. Various views are summarized and our view is presented.

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