Ti6Al4V alloy samples were modified by tantalum ions implantation at the doses of 1.2×1016

3×1016

1.5×1017

3×1017 and 4.5×1017ions/cm2

with an acceleration voltage of 146.5 keV.Potential-dynamic polarization technology was used to investigate corrosion resistance of the Ta+-implanted Ti6Al4V alloy samples in Hank’s solution.Glancing angle X-ray diffraction and X-ray photoelectron spectroscopy were used to characterize of the implanted samples in terms of the phase composition and chemical states of the surface elements

respectively.The Ta ion implantation improves corrosion resistance of Ti6Al4V alloy.However

corrosion current density of the implanted samples was not in a monotonic way of decrease with increasing ion doses.The corrosion resistance improvement of Ta+-implanted Ti6Al4V alloy samples in Hank’s solution is attributed to the corrosion-resistant oxide layer

surface alloy layer produced in the ion implantation

and the Ta in outmost surface of the implanted alloy.