Measurement of Au sputtering yield with low energy Ar ion by backscattering

Jiazeng Hu; Guoming Chen; Zuyao Zhou; Congxin Ren; Jie Yang; Xinding Fu; Dezhang Zhu; Dexin Cao

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Measurement of Au sputtering yield with low energy Ar ion by backscattering

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- Measurement of Au sputtering yield with low energy Ar ion by backscattering
- Nuclear Techniques Vol. 10, Issue 9, (1987)
- 作者机构：
  
  1.中国科学院上海冶金研究所
  2.中国科学院上海原子核研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：06 June 1985，
  
  Published：1987-09
- 稿件说明：
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Jiazeng Hu, Guoming Chen, Zuyao Zhou, et al. Measurement of Au sputtering yield with low energy Ar ion by backscattering[J]. Nuclear techniques, 1987, 10(9): 1-4,60.
DOI：

Jiazeng Hu, Guoming Chen, Zuyao Zhou, et al. Measurement of Au sputtering yield with low energy Ar ion by backscattering[J]. Nuclear techniques, 1987, 10(9): 1-4,60. DOI：

摘要

本文用背散射方法测定了300—1200eV不同能量的氩离子对金的溅射率。实验测得的背散射能谱用两种不同的方法（能量损失和面积法）处理，结果表明，用背散射法测得金的溅射率与G. K. Wehner用称重法测定的数据很接近，其与入射离子能量的关系为

∝E

0.4

。

Abstract

Au sputtcring yield with Ar

ions of 300—1200 eV is measured by backscattering. The backscattering spectra are treated by two methods (energy loss method and area method). The results show that Au sputtering yield measured by RBS is in agreement with G. K. Wehner's result by weight method. The relation between our experimental sputtering yield and ion energy is y∝E

0.4

. This energy relation gives a good agreement with P. Sigmund's theory when m=0.3.

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references

阿滕康郎，真空（日） , 23 , 339 ( 1980 )。

N. laegreid and G. K. Wehner , J. APPl. Phys. , 32 , 365 （ 1961 ).

R. Behrisch and R. Weismann , Phys. lett. , 30A , 506 ( 1969 ).

Z. L. Liau et al ., J. Vac. Sci. Technol. , 16 , 1-3 , 121 （ 1979 R ）.

陈国明等，电子技术， 5 , 5 ( 1980 )。

Ion Beam Analysis Group , Shanghai Institute of Metallurgy and Shanghai Institute of Nuclear Research , Inter. J. Electr . , 46 , 5 , 513 ( 1979 ).

H. Von. Seefeld et al. , J. Nucl. Mater. , 63 , 215 ( 1976 ).

J. F. Ziegler , Helium stopping powers and ranges of ions in matter , Pergamon Press , New York , 1977 .

Yasubito Yamamoto , Japan. J. Appl. Phys. , 15 , 11 , 2285 ( 1976 ).

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