Studies on the fractionation of Cu isotopes by 27 keV Ar+ sputtering for Cu and CuAu alloy

Zhenxia Wang; Zhenlan Tao; Liping Zheng; Chunchang Sun

您当前的位置：

首页 >

文章列表页 >

Studies on the fractionation of Cu isotopes by 27 keV Ar+ sputtering for Cu and CuAu alloy

更新时间：2022-09-13

- Studies on the fractionation of Cu isotopes by 27 keV Ar+ sputtering for Cu and CuAu alloy
- Nuclear Techniques Vol. 10, Issue 9, (1987)
- 作者机构：
  
  中国科学院上海原子核研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：28 October 1986，
  
  Published：1987-09
- 稿件说明：
移动端阅览
Zhenxia Wang, Zhenlan Tao, Liping Zheng, et al. Studies on the fractionation of Cu isotopes by 27 keV Ar+ sputtering for Cu and CuAu alloy[J]. Nuclear techniques, 1987, 10(9): 5-7,60.
DOI：

Zhenxia Wang, Zhenlan Tao, Liping Zheng, et al. Studies on the fractionation of Cu isotopes by 27 keV Ar+ sputtering for Cu and CuAu alloy[J]. Nuclear techniques, 1987, 10(9): 5-7,60. DOI：

摘要

本文报道了27keV Ar+离子分别轰击Cu元素靶和CuAu合金靶时溅射Cu原子的同位素（

Cu和

Cu）分馏测量结果，发现：（1）对Cu元素靶，同位素分馏

（

Cu)=（62±27）‰

而对CuAu合金靶，δr=(5.9±1.6）‰; （2）δr（

Cu）随发射角

的变化对两者靶而言趋势是相似的，但在CuAu合金靶情况下，当

≤40

时，δ

（

Cu）为负值。

Abstract

In this paper we report results of isotopic fractionation

(

Cu) in both elemental Cu and binary alloy Cu

during sputtering by Art ion (27keV). The present observations show that larger mass-dependent isotopic fractionation effects accompany the sputtering process: (1) For elemental Cu target

(

Cu)= (62 ± 27)‰

for binary alloy Cu

0.7

target

(

Cu)= (5.9±1.6)‰; (2) Angular distributions of isotopic fractionations

(

Cu) are similar in both Cu and Cu

but we note that for alloy sample (CuAu) the

(

Cu)

0 at

(angle of ejection)

45°. These retsults indicate that sputtering produces isotope fractionation and that there is difference in both angular distributions of

for Cu target and Cu

0.7

0.3

target.

关键词

Keywords

references

H. G. Thode and C. E. Rees , Earth Planet. Sci. lett. , 12 , 434 ( 1971 ).

W. A. Russell et al. , Proc.8th lunar sci. conf. , 1977 , p. 3791 .

R. N. Cayton et al. , Proc, 5th lunar sci. conf. , Pergaman Press , New York ， 1974 , p. 1801 .

W. A. Russell et al. , Radiation Effects , 52 , 41 ( 1980 ).

R. R. Olson et al ., J. Appl. phys . , 50 , 5 , 3677 ( 1979 ).

王震遐等，核技术 , 2 , 11 ( 1986 ).

O. Arai et al. , Japan. J. Appl. phys. , 15 , 407 ( 1976 ).

C. C. Watson and P. K. Haff . J. Appl. Phys . , 51 , 1 , 691 ( 1980 ).

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Influence of sputtering and out-diffusion in Er implanted SiO₂/Si on depth profile

Isotope effect of ion sputtering

Classical scattering cross section in sputtering transport theory

Range of keV ions in Mylar films

Effect of 195keV argon ions’bombardment on surface topography of amorphous alloys

Related Author

刘安东

ZHANG Tonghe WU Yuguang XIAO Zhisong LIU Andong

吴瑜光

肖志松

GUO Wenlu ZHANG Xiurong

张秀荣

ZHANG Zhulin

韩建伟

Related Institution

Key Laboratory for Radiation Beam Technology and Materials Modification, Beijing Normal University

Institute of Low Energy Nuclear Physics, Beijing Normal University

University of Science and Technology of Jiangsu

江苏科技大学

Department of mathematics & Physics, Huainan Institute of Technology

AI问答

Address：2019 Jialuo Road, Jiading, Shanghai, China Postal code：201800
Tel：021-39194977 Email：LHB@sinap.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 沪ICP备05005479号-1 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.
Total Visits：880565 Visits Today：92

⁰