The method for measurement of depth profile of tritium implanted or absorbed in materials is described. The sensitivity of this technique may reach 0.1 at%. When the target is 4 mg/cm
2
the depth resolution may reach 0.46 mg/cm
2
.
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references
J. C. Davis and J. D. Anderson , J. Vac. Sci. Technol . , 12 , 358 ( 1975 )。
H. W. Lefevrc et al . , Proceedings of the fourth conference on the scientific and industrial applications of small accelerators , North Texas State University , October, 27—29, 1976 , p. 225 .