A compact sputtering PIG ion source

Jinxiang Yu

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A compact sputtering PIG ion source

更新时间：2022-09-13

- A compact sputtering PIG ion source
- Nuclear Techniques Vol. 09, Issue 7, (1986)
- 作者机构：
  
  北京大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：20 September 1984，
  
  Published：1986-07
- 稿件说明：
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Jinxiang Yu. A compact sputtering PIG ion source[J]. Nuclear techniques, 1986, 09(7): 11-14,59.
DOI：

Jinxiang Yu. A compact sputtering PIG ion source[J]. Nuclear techniques, 1986, 09(7): 11-14,59. DOI：

摘要

本文描述一个袖珍端引出溅射PIG离子源。它用SmCo永久磁钢来产生源的约束场。该源既可以产生气体离子，也可以通过阴极溅射，产生相应金属离子。用该源通常可获得Ar

500—680µA，Ar

~150μА；当用BF

做放电气体时，可得，放电功率约为30W。当用Ar做辅助气体时，在30—50W的弧功率下，可得锆、铁、铝等金属离子70多µA；钽离子50—60µA；钛、钼等金属离子30多µA。两个电荷态的金属离子通常约为一个电荷态金属离子的1/2—1/5。

Abstract

A compact sputtering PIG ion source with end extraction was described

which can produce both gas and metal ions from cathode materials. The magnetic field is provided by a SmCo permanent magnet. Using Ar and BF

as the discharge gas when discharge power was about 30 W

500—680 µA for Ar

150 µA for Ar

and 100—130 µA for B

beam intensities were produced. With argon auxiliary gas

we have got 70 µA for Zr

etc.

50—60

µA

for Ta

and about 30 µA Ti

metal ions beam intensities. The beam intensity of double charge metal ions were usually 1/2—1/5 of that of single charge metal ions.

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references

H. Baumann et al . , Nucl. Instr. Meth. , 189 , 107 （ 1981 ）.

H. Baumann et al . , IKF -42, Jahresbrich , 1982 , p. 87 .

K. J. Hill , and R. S. Nelson , Nucl. Instr. Meth. , 38 , 15 （ 1965 ）.

B. F. Gavin , ibid , 64 , 73 （ 1968 ）.

B. H. Wolf , ibid , 139 , 13 ( 1976 ）.

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