The analysis of nuclear target impurity with backscattering method

Guoji Xu; Yuhua Zhao; Shengnan Zheng; Yongchang Xu

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The analysis of nuclear target impurity with backscattering method

更新时间：2022-09-13

- The analysis of nuclear target impurity with backscattering method
- Nuclear Techniques Vol. 06, Issue 2, (1983)
- 作者机构：
  
  中国科学院原子能研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：04 May 1982，
  
  Published：1983-04
- 稿件说明：
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Guoji Xu, Yuhua Zhao, Shengnan Zheng, et al. The analysis of nuclear target impurity with backscattering method[J]. Nuclear techniques, 1983, 06(2): 36-37,76.
DOI：

Guoji Xu, Yuhua Zhao, Shengnan Zheng, et al. The analysis of nuclear target impurity with backscattering method[J]. Nuclear techniques, 1983, 06(2): 36-37,76. DOI：

摘要

在使用真空蒸发和电镀两种方法制备核靶的过程中，基衬、脱膜剂和坩埚等都会给核靶带来污染。用合适的方法分析核靶的污染，从而改进制备工艺，是制靶技术迫切需要解决的问题。我们用背散射技术分析了核靶中的杂质，使用2MeV的

离子束，散射角为160°和135°，探测系统的能量分辨率为16keV。

Abstract

This paper describes the analysis of nuclear target impurity contaminated by substrate

crucible and remainder gases with the backscattring method. Some examples of anaylsis of target impurity are given. Both the advantages and the drawbacks of this method are mentioned.

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references

Wei-Kan Chu , Backscattering spectrometry , Academic Press , New York , 1978 . p. 126 .

ibid , p. 108 .

ibid , p. 106 .

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