Acceptance diagram analysis of the ion implanter

Renkang Cai

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Acceptance diagram analysis of the ion implanter

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- Acceptance diagram analysis of the ion implanter
- Nuclear Techniques Vol. 13, Issue 12, (1990)
- 作者机构：
  
  上海科技大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：04 December 1989，
  
  Published：01 December 1990
- 稿件说明：
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Renkang Cai. Acceptance diagram analysis of the ion implanter[J]. Nuclear techniques, 1990, 13(12): 740-748.
DOI：

Renkang Cai. Acceptance diagram analysis of the ion implanter[J]. Nuclear techniques, 1990, 13(12): 740-748. DOI：

摘要

束流光学系统中各个元件的接受相图变换到同一地点，得到整个系统的接受相图。束流光学设计的任务就是使束流的发射相图与系统的接受相图相匹配。从它们的匹配情况可以估计束流的传输效率。本文以LC-2B型离子注入机为例说明了这个方法的应用。

Abstract

The acceptance diagrams of the components in a beam optics system are transformed to a certain point to form the acceptance diagram of the whole system. The task of beam optics calculation is to match the beam emittance diagram with the acceptance diagram of the system. The beam transportation efficiency can then be estimated. The ion implanter of LC-2B type is used as an example to illustrate the application of this technique.

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references

W. Z. Zhang et al . , Nucl. Instr, Meth . , A240 （ 1985 ）, 229 .

W. Z. Zhang et al . , Nucl. Instr. Meth . , A260 （ 1987 ）, 313 .

张维忠，接受相图方法的新应用，中国粒子加速器学会第三次粒子动力学和带电粒子光学学术讨论会会议文集， 1987 年。

叶铭汉等，静电加速器，科学出版社，北京， 1965年版，第404页。

K. L. Brown and S. K. Howry , TRANSPORT/360 SLAC-91 ( 1979 ）.

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