Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams

Xingliu Jiang; Tianmin Wang; Jincheng Gao; Lijun Han; Bingqing Li

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Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams

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- Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams
- Nuclear Techniques Vol. 13, Issue 8, (1990)
- 作者机构：
  
  兰州大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：17 October 1988，
  
  Published：1990-08
- 稿件说明：
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Xingliu Jiang, Tianmin Wang, Jincheng Gao, et al. Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams[J]. Nuclear techniques, 1990, 13(8): 474-477.
DOI：

Xingliu Jiang, Tianmin Wang, Jincheng Gao, et al. Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams[J]. Nuclear techniques, 1990, 13(8): 474-477. DOI：

摘要

本文介绍一种利用高功率脉冲电子束溅射法制备金属多层膜的新方法。强脉冲电子束轰击金属靶将产生瞬态高温等离子体，从这种等离子体中飞出的金属离子沉积在附近的衬底上，从而制得Co/Tl系和其他多种金属多层膜。本文报道了对多层膜进行的TEM和AES研究的结果。

Abstract

A new approach of preparation for thin multilayer films is described. A powerful pulsed e-beam is used to irradiate a metal target

leading to the formation of transient hot plasma. The energetic metal ions ejected from such plasma are deposited on the surface of the near-by substrate. The multilayer films of Co/Ti system and other metals have been prepared. The TEM and AES investigations for such films are reported.

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references

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韩丽君和江兴流，科学通报， 34 （ 1989 ）， 196 .

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X. L. Jiang et al ., Formation of alloy microspheres under implantation by using intense pulseion beams, ISAIBA′87 , Jinan, China , B-P-44 .

X. L. Jiang and S. C. Jiang , IEEE. NS-32 （ 1985 ）, 2492 .

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