Electrical conductivity and XPS spectra of the ion implanted Q thin films

Peilu Wang; Ping Zhou; Zhongyang Liu; Jingyun Jiang; Kelu Feng

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Electrical conductivity and XPS spectra of the ion implanted Q thin films

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- Electrical conductivity and XPS spectra of the ion implanted Q thin films
- Nuclear Techniques Vol. 13, Issue 6, (1990)
- 作者机构：
  
  1.四川大学原子核科学技术研究所
  2.四川大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：31 August 1988，
  
  Published：01 June 1990
- 稿件说明：
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Peilu Wang, Ping Zhou, Zhongyang Liu, et al. Electrical conductivity and XPS spectra of the ion implanted Q thin films[J]. Nuclear techniques, 1990, 13(6): 350-354.
DOI：

Peilu Wang, Ping Zhou, Zhongyang Liu, et al. Electrical conductivity and XPS spectra of the ion implanted Q thin films[J]. Nuclear techniques, 1990, 13(6): 350-354. DOI：

摘要

离子注入Q薄膜，使其电导率增加了8个数量级，饱和电导率达2×10

-3

（

Ω

-1

），且在环境条件下十分稳定。XPS分析表明，薄膜注入后表层注入区碳含量显著增加，氧含量明显下降，结构发生变化。研究表明，这是电导变化的主要原因。

Abstract

Ion implantation causes an increase of electrical conductivity of the Q thin films by 8 orders of magnitude and the saturated value is about 2×10

-3

(

Ω

cm)

-1

. The conductivity is very stable under exposure to ambient conditions. XPS analysis has shown a notable increase of carbon concentration an obvious decrease of oxygen concentration and a change of the pristine structure in the implahted zone. The results indicate that structure change is a main reason for the increase of electrical conductivity.

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references

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H. Mazurek et al . , J. Polymer Science : Polymer Physics Edition , 21 （ 1983 ）, 537 .

T. Venkatesan , Nucl . Instr . Meth. in Physics Research , B7/8 （ 1985 ）, 461 .

K. F. Jr. Schoch and J. Bartko , Polymer , 28 （ 1987 ）, 556 .

Hsln-Kuel Hu et al . , J. Physr Chem , 86 （ 1982 ）, 17 : 3365 .

M. L. Kaplan et al . , J. Appl. Phys . , 55 （ 1984 ）, 3 : 732 .

T. Venkatesan et al . , J. Appl. Phys. , 56 （ 1984 ）, 10 : 2778 .

G. E. Wnek et al . , Mat. Res. Soc. Symp. Proc . , 27 （ 1984 ）, 435 .

B. Wasserman et al . , Mat. Res. Soc. Symp. Proc . , 27 （ 1984 ）, 423 .

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