Ion sputtering and its applications

Zhenxia Wang

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Ion sputtering and its applications

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- Ion sputtering and its applications
- Nuclear Techniques Vol. 12, Issue 8-09, (1989)
- 作者机构：
  
  中国科学院上海原子核研究所
- 作者简介：
- 基金信息：
- DOI：
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- Published：1989-09
- 稿件说明：
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Zhenxia Wang. Ion sputtering and its applications[J]. Nuclear techniques, 1989, 12(8-09): 549-552.
DOI：

Zhenxia Wang. Ion sputtering and its applications[J]. Nuclear techniques, 1989, 12(8-09): 549-552. DOI：

摘要

本文综述了离子溅射理论和实验研究的主要进展，着重分析了合金样品由于原子质量、表面结合能差别以及离子轰击导致的Gibbsian偏析等因素所引起的择优溅射。扼要地讨论了Tokamak第一壁材料的离子溅射、生物大分子的重离子解吸以及集团离子对固体表面的冲击。此外还指出，集团对固体表面的溅射过程在表面薄层中的能量转移特大并具有很高的溅射产额，这将在改变固体表面结构以及在超微量和微米束分析中得到新的实际应用。

Abstract

Major developments both in theory and in experiments on ion sputtering have been summarized with the emphasis on preferential sputtering of alloy arising from mass differences

surface binding energy differences and bombardment-induced Gibbsian segregation. The ion sputtering of the first wall in Tokamaks

heavy ion sputtering of biomolecular materials and cluster sputtering on solid surfaces are discussed briefly. In addition

it is indicated that cluster impact processes are of some practical interest because they have the potential of depositing large amounts of translational energy in very thin surface layers with very large sputtering yeild. Some possible applications of cluster sputtering include altering surface structures and developing techniques for SIMS and microbeam analysis.

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references

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