Platinum films about 55nm thick were deposited onto Si (111) substrates. The samples were implanted with 300keV As
+
ions at room temperature. The oriented growth of PtSi was observed from the results of X-ray diffraction analysis. The preferred orientation of PtSi induced by ion irradiation and post-annealing is (101) . A possible growth mechanism of the interfacial PtSi was proposed on basis of the Bravais crystal theory and lattice matching condition.
In addition
the oriented growth of PtSi was found to be affected by the orientation of Si substrates. Platinum silicide grown on Si (100) has no obvious orientation.
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references
J. M. Poate et al . eds. , Thin films-interdiffusion and reaction , Wiley , New York , 1978 .