The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam
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The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam
Nuclear TechniquesVol. 11, Issue 4, (1988)
作者机构:
1.中国科学院上海原子核研究所
2.中国科学院上海冶金研究所
作者简介:
基金信息:
DOI:
CLC:
Received:20 April 1987,
Published:1988-04
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Zhenxia Wang, Zhenlan Tao, Liping Zheng, et al. The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam[J]. Nuclear techniques, 1988, 11(4): 13-16.
DOI:
Zhenxia Wang, Zhenlan Tao, Liping Zheng, et al. The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam[J]. Nuclear techniques, 1988, 11(4): 13-16.DOI:
The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam
The angular distributions of sputtered Cu and Au atoms have been measured under normal and oblique incidence bombardment with 27 keV Ar
+
for Cu-Au (30 wt%) alloy. Sputtering material on Al collector has been analysed by RBS technique.
The results indicate that copper atoms are ejected preferentially under oblique incidence bombardment (
θ
T
=40°) and the preferential ratio for oblique incidence is higher than that for normal incidence (
θ
T
=0°). From the angular distributions of sputtered copper atoms the ejection probability in the ejected angle region between 0° and 45° for oblique incidence is found to be lower than that for normal incidence.
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references
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