The Ag/Si thin film prepared by using ion assisted deposition

Xianzheng Pan; Xinming He; Bin Wang; Liqiu Zhang

您当前的位置：

首页 >

文章列表页 >

The Ag/Si thin film prepared by using ion assisted deposition

更新时间：2022-08-16

- The Ag/Si thin film prepared by using ion assisted deposition
- Nuclear Techniques Vol. 10, Issue 1, (1987)
- 作者机构：
  
  武汉大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：1987-01
- 稿件说明：
移动端阅览
Xianzheng Pan, Xinming He, Bin Wang, et al. The Ag/Si thin film prepared by using ion assisted deposition[J]. Nuclear techniques, 1987, 10(1): 47-50,64.
DOI：

Xianzheng Pan, Xinming He, Bin Wang, et al. The Ag/Si thin film prepared by using ion assisted deposition[J]. Nuclear techniques, 1987, 10(1): 47-50,64. DOI：

摘要

离子束辅助沉积（以下简称IVD）方法是将离子束技术与真空沉积薄膜技术相结合的一种新的制膜方法。它具有沉积速率高、薄膜吸附强度大、薄膜外延温度低并能消除膜应力等优点。因此，近年来在国际上受到重视和发展。

Abstract

The method of ion assisted vapour deposition (IAD or IVD) for preparing thin films is described in this paper. The comparison of the Ag/Si thin film prepared by IVD with those prepared by conventional vacuum vapour deposition have been made. The interface ion mixing of Ag-Si

and the surface microstructure of the Ag/Si thin films are measured by RBS

TЕМ SEM etc.

关键词

Keywords

references

S. S. Nandra et al. , Thin Solid Films , 107 , 335 ( 1983 ).

E. K. Broadbenh , Solid State Tech. , 26 , 4 , 201 ( 1983 ).

E. H. Herch and I. K. Varga , Thin solid Films. , 52 , 445 ( 1978 ).

L. Pranevichus , Nucl. Instr. Meth. , 182/183 , 251 ( 1981 ).

程世昌，真空科学与技术， 3 ， 3 , 184 ( 1983 )。

L. Pranevichus and S. Tamulevichus , Nucl. Instr. Meth. , 209/210 , 179 ( 1983 ).

B. A. Banks and S. K. Rutledge ， J. Vac. Sci. Tech. , 21 , 3 , 807 ( 1982 ).

T. Takagi , Proc. int. workshop by professional group on ion beam techniques for film formation , Kyoto , 1981 . p. 473 .

C. Weissmantel , J. Vac. Sci. Tech. , 18 , 2 , 315 ( 1981 ).

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

No data

Related Author

No data

Related Institution

No data

AI问答

Address：2019 Jialuo Road, Jiading, Shanghai, China Postal code：201800
Tel：021-39194977 Email：LHB@sinap.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 沪ICP备05005479号-1 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.
Total Visits：880565 Visits Today：92

⁰