Structure changes of ion implantation measured by X-ray diffraction analysis

Guowei Ling; Xiaozhong Zhang

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Structure changes of ion implantation measured by X-ray diffraction analysis

更新时间：2022-08-16

- Structure changes of ion implantation measured by X-ray diffraction analysis
- Nuclear Techniques Vol. 09, Issue 8, (1986)
- 作者机构：
  
  清华大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：1986-08
- 稿件说明：
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Guowei Ling, Xiaozhong Zhang. Structure changes of ion implantation measured by X-ray diffraction analysis[J]. Nuclear techniques, 1986, 09(8): 44-47,64.
DOI：

Guowei Ling, Xiaozhong Zhang. Structure changes of ion implantation measured by X-ray diffraction analysis[J]. Nuclear techniques, 1986, 09(8): 44-47,64. DOI：

摘要

离子注入用于金属材料表面强化已有十多年历史。国内外已取得许多重要结果。对于离子注入所造成强化的机理研究，将有助于解决实际的工业应用和所存在的问题。迄今，国外报道均采用穆斯堡尔谱仪和电子衍射测定氮离子注入钢铁材料后引起的结构变化。本文利用X射线衍射方法研究了注入剂量和生成相、生成相和退火温度以及耐磨性和材料结构之间的相互关系。

Abstract

By using X-ray diffraction analysis

the correlation between ion flux and resultant phase

resultant phase and temperature as well as the wear resistance and structure were studied. The experimental results indicated that the X-ray diffraction analysis is a suitable method for analysing implanted layer.

关键词

Keywords

references

G. Longworth and N. E. W. Hartley , Thin Solid Films , 48 , 95 （ 1978 ）.

K. Hohmuth et al . , Nucl. Instr. Meth. , 209/210 , 249 （ 1983 ）.

G. Principi et al . , J. Mater. Sci. , 15 , 2665 （ 1980 ）.

R. Fratlini et al . , J. Mater. Sci. , 17 , 683 （ 1982 ）.

E. Ramous et al . , Thin Solid Films , 102 , 97 （ 1983 ）.

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