Primary results of pulsed ion beam implantation with high beam power densities

Xingliu Jiang; Tianmin Wang

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Primary results of pulsed ion beam implantation with high beam power densities

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- Primary results of pulsed ion beam implantation with high beam power densities
- Nuclear Techniques Vol. 09, Issue 8, (1986)
- 作者机构：
  
  兰州大学
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：1986-08
- 稿件说明：
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Xingliu Jiang, Tianmin Wang. Primary results of pulsed ion beam implantation with high beam power densities[J]. Nuclear techniques, 1986, 09(8): 42-44,64.
DOI：

Xingliu Jiang, Tianmin Wang. Primary results of pulsed ion beam implantation with high beam power densities[J]. Nuclear techniques, 1986, 09(8): 42-44,64. DOI：

摘要

离子注入用于半导体器件和大规模集成电路的生产中，显示出这种工艺的许多优越性

[1]

。七十年代初期，哈威尔实验室等研究部门开始进行离子注入技术在非半导体材料中的应用研究

[2]

。大量实验结果表明，仅几千埃的注入深度就能对金属材料的磨损和抗氧化性能起积极的影响，如一定浓度的氮离子注入钢能显著提高钢材的耐磨性，而且小于0.5µm的注入层能使20µm深度处的耐磨性仍有改善；适当剂量的Cr和Zr注入氧化铝陶瓷中，能起到硬化作用；钛离子注入模具能减少磨损，而且比注N

时的耐磨性能好，因为金属中N原子在高温下的扩散逃逸比钛原子严重得多。离子注入技术的发展将提供材料改性的新手段，如制成超级合金和性能优异的涂层，得到所需的耐磨损、抗腐蚀、高硬度、高强度和特殊的光学、电学、磁学性能。

Abstract

A new method of pulsed ion beam implantation is introduced. As an example

the mixed Ti

and N

ion beams produced with the multiplate chamber were implanted onto the surface of iron and steel samples. The primary analysis shows that there are great changes of the compositions and the structures as well as properties of the sample in the implanted area.

Because of the simple geometry and the high efficincy

the multiplate chamber is expected to have a wide application in the fields of material modification and testing.

关键词

Keywords

references

北京市辐射中心，离子注入原理与技术，北京出版社， 1982 年。

G. Dearnaley , Phys. Technol. , 14 , 225 （ 1983 ）.

江兴流等，物理学报， 32 , 1344 （ 1983 ）。

N. Kurita et al . , Japanese J. Appl. Phys. , 21 33 （ 1982 ）.

梁培辉等，中国激光 , 10 , 7 , 438 （ 1983 ）。

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