A study on the surface damage of R-IBE crystals by RBS-channeling technique

Dexin Cao; Congxin Ren; Jie Yang; Zuyao Zhou; Wei Zhou; Shichang Zou

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A study on the surface damage of R-IBE crystals by RBS-channeling technique

更新时间：2022-08-16

- A study on the surface damage of R-IBE crystals by RBS-channeling technique
- Nuclear Techniques Vol. 09, Issue 3, (1986)
- 作者机构：
  
  1.中国科学院上海原子核研究所
  2.中国科学院上海冶金研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：0б June 1985，
  
  Published：1986-03
- 稿件说明：
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Dexin Cao, Congxin Ren, Jie Yang, et al. A study on the surface damage of R-IBE crystals by RBS-channeling technique[J]. Nuclear techniques, 1986, 09(3): 19-21,56.
DOI：

Dexin Cao, Congxin Ren, Jie Yang, et al. A study on the surface damage of R-IBE crystals by RBS-channeling technique[J]. Nuclear techniques, 1986, 09(3): 19-21,56. DOI：

摘要

在大规模集成电路发展过程中，随着集成度的不断提高，要求电路的线条不断变细，等离子、离子束及反应离子刻蚀等加工工艺将起着重要的作用

[1-3]

。它们为大规模集成电路生产提供了强有力的微细加工手段。离子束刻蚀类似于机械研磨，离子束能量和样品的位置可变，具有各向异性。在加工过程中，样品表面存在一定量的损伤，从貌相看还存在起伏不平的“小丘”。等离子和反应离子刻蚀克服了各项异性，但离子能量和刻蚀的方向不可调节，所以也有局限性。

Abstract

This paper reported the study on the surface damage

and its annealing of R-IBЕ(reaction ion beam etched) crystal by RBS-channeling technique. The topography of the etched surface was observed by SEM.

The experimental results show that the reactive ion beam etching with CF

results in a surface damage layer and the amount of the damage increases with increasing the energy of the ion beam.

关键词

Keywords

references

J. W. Coburn et al . , J. Appl. Phys. , 48 , 3532 ( 1977 ).

J. W. Coburn and H. F. Winters , J. Appl. Phys. , 50 , 3189 ( 1979 ).

Yoshihiko Yoshihiko et al . , Japanese J. Appl. Phys. , 22 , 1206 ( 1983 ).

D. F. Dowsey , Solid State Technol. , 24 , 121 ( 1981 ).

S. Matsui et al . , Japanese J. Appl. Phys. , 19 , L1 26 ( 1980 ).

M. A. Bösch et al . , Appl. Phys. Lett. , 38 , 264 ( 1981 ).

T. M. Mayer and R. A. Barker , J. Electr. Chem. Soc. , 129 , 585 ( 1982 ).

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