The study of ion sputtering mechanism on Cu-Au alloy

Zhenxia Wang; Fuying Zhu; Wenbiao Chen; Dexin Cao; Zuyao Zhou; Hengshan Zhang; Ahu Zhang

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The study of ion sputtering mechanism on Cu-Au alloy

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- The study of ion sputtering mechanism on Cu-Au alloy
- Nuclear Techniques Vol. 09, Issue 1, (1986)
- 作者机构：
  
  1.中国科学院上海原子核研究所
  2.中国科学院上海冶金研究所
  3.上海半导体器件研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：09 August 1984，
  
  Published：1986-01
- 稿件说明：
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Zhenxia Wang, Fuying Zhu, Wenbiao Chen, et al. The study of ion sputtering mechanism on Cu-Au alloy[J]. Nuclear techniques, 1986, 09(1): 28-31,37,61.
DOI：

Zhenxia Wang, Fuying Zhu, Wenbiao Chen, et al. The study of ion sputtering mechanism on Cu-Au alloy[J]. Nuclear techniques, 1986, 09(1): 28-31,37,61. DOI：

摘要

本文报道了用热中子活化法测量Cu-Au合金在80keV Ar

离子不同剂量轰击下的部分溅射产额比S

，并用卢瑟福背散射（

RBS

）技术分析样品中元素的反冲以及表面层成分的相对变化，从而研究了元素择优溅射对表面层变化所起的作用。

Abstract

Dose dependence in preferential sputtering and altered surface layer of Cu-An alloy has been studied by using thermal-neutron activation and Rutherford backscattering(RBS). The copper-gold sputtering atom ratio S

decreases with increasing ion dose. The results of RBS measurement show that the recoil implantation of gold atoms raises with increasing ion dose. The fact suggests that the bombardment of Ar

ions onto Cn-Au alloy films causes the preferential sputtering of Cu atoms resulting in the depletion of Au atoms in the outmost surface layer and the Au-rich beneath this layer.

关键词

Keywords

references

R. Kelly , Nucl. Instr. Meth. , 149 , 553 ( 1978 ).

G. Betz , Surf. Sci. , 92 , 283 ( 1980 ).

Z. L. Liam et al . , Appl. Phys. Lett. , 30 , 626 ( 1977 ).

W.T. Oger et al . , J. Appl. Phys. , 40 , 4997 ( 1969 ).

N. Anderson and P. Sigmund , Mat. Fys. Medd. Dan. Vid. Selsk. , 39 , 3 , 1 ( 1974 ).

J. J. Jimenez-Rodriguez et al . , Radiat. Eff. , 41 , 165 ( 1979 ).

H. H. Andersen et al . , Nucl. Instr. Meth. , 230 , B2 , 601 ( 1984 ).

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