在核物理制靶技术中，采用真空蒸发制备有衬靶和自支撑靶膜较为普遍。为了在蒸发过程中测量靶膜的生长情况和控制薄膜厚度，我们自制了膜厚监控石英晶体振荡器。

这一设备比较简单，使用方便。根据我们的实际情况，分别得到六种元素的频率与厚度的关系曲线。从而改善了以前采用几何方法估计蒸发材料的不准确性。

It is sometimes necessary to monitor and control the thicknees of a film during the process of vacuum evaporation. This paper describes a quartz oscillator for this purpose. It is based on the frequency variation caused by the change in thickness of crystal surface. The calibrations for frequency variation per unit thicknees have been performed using six elements of Pb

Bi

Cu

Au

Al

and Ag.